Prof. David Z. Pan and his research group won the Best Paper award from the ACM International Symposium on Physical Design (ISPD) 2020 for their paper “TEMPO: Fast Mask Topography Effect Modeling with Deep Learning.”

Authors on the paper were Wei Ye, Mohamed Baker Alawieh, Yuki Watanabe, Shigeki Nojima, Yibo Lin, and David Z. Pan.

ISPD is a premier forum for IC physical design and related areas. This is the third time Dr. Pan's research group has won the ISPD Best Paper Award.