Photo: David Pan (standing middle) receives the SRC 2013 Technical Excellence Award from Larry Sumney, SRC President & CEO (left) and Steve Hillenius, SRC Executive Vice President (right), at the SRC Techcon in Austin, TX, Sept. 9, 2013.
Professor David Pan of UT ECE received the Semiconductor Research Corporation (SRC) 2013 Technical Excellence Award at the SRC Annual TECHCON conference, held in Austin, Texas on Sept. 9-10. SRC is the world’s leading technology research consortium for semiconductors and related technologies. The Technical Excellence Award recognizes researchers who have made key contributions to technologies that have significantly enhanced the productivity of the semiconductor industry. In receiving this award, Prof. Pan was cited for his SRC-funded work in the area of “Nanometer IC Design for Manufacturability”. According to the SRC web site, “The fundamental elements upon which the decision is based include: Creativity and Innovation, Relevance, Value to Industry and Technology Transfer.”
As the IC design and manufacturing technologies are scaled into the sub-45nm regimes, it is critical to link circuit physical design and the underlying manufacturing process together. The challenge is exacerbated now as the industry is extending the 193nm lithography to print feature size as small as 22nm to 14nm. Professor Pan and his graduate students have made fundamental contributions in cross-layer design for manufacturability, including variational lithography modeling, full-chip lithography hotspot detection using machine learning and pattern matching, layout decomposition & physical design for multiple patterning lithography, standard cell DFM, DFM-aware routing, and CAD for emerging lithography.Their researches have spearheaded many first-of-its-kind studies and won a number of best paper awards (e.g., at ICCAD’13, SRC Techcon’12, ASPDAC’12, ISPD’11, IBM Research 2010 Pat Goldberg Memorial Best Paper Award in CS/EE/Math, ASPDAC’10, ICICDT’09), international contest prizes, SRC Inventor Recognition Awards, among others. The results have been widely used in industry. And as of September 16, 2013, there are over 3,400 citations to his work. More about Prof. Pan’s research in this area can be found at hisPoster Presentation at the SRC 2013 Techcon.
Prof. David Pan is the third UT faculty member who has won this prestigious research award from SRC. The previous two UT faculty winners are Prof. Grant Willson (Chemical Engineering, 1996) and Prof. Al Tach (Electrical and Computer Engineering, 1991).
More about the SRC Technical Excellence Award:
